Initial stages of growth of poly(p-xylylene) coatings: AFM study

Abstract

The morphology of poly(p-xylylene) ultrathin films prepared by vapor deposition polymerization on the surface of single-crystal silicon (100) and on the cleaved surface of mica at a substrate temperature of 20°C has been studied by atomic force microscopy. At the initial stage, the growth of the poly(p-xylylene) coating follows the island mechanism. Within the framework of pyramidal model of island growth, the mean diffusion length for monomer p-xylylene is calculated: For the single-crystal silicon, this parameter is 15 ± 3 nm; for the cleaved surface of mica, 9 ± 2 nm. The nature of the substrate and defects on its surface show a peculiar effect on the structure of the poly(p-xylylene) coating. Thus, at a low monomer flow, nucleation of polymer islands on the surface of silicon is predominantly homogeneous, whereas on the cleaved surface of mica, it is heterogeneous. A change in the monomer flow significantly affects the rate of nucleation of polymer islands.