Abstract

The initial stages of the nucleation of cubic (c-) GaN in heterophase epitaxy on a Si v-groove are investigated. Growth of GaN on a nanoscale {111}-faceted v-groove fabricated into a Si(001) substrate proceeds in the hexagonal (h-) phase that induces a secondary v-groove replicating the substrate topography with two opposing {0001} facets. The secondary v-groove is then orientationally mismatched at the junction of the h-GaN facets (h–h junction) resulting in structural instability. This instability is relieved either by the formation of voids that reduce the actual junction area or by the transition to c-phase (h–c transition) suppressing further extension of the h–h junction. The distribution of voids that is locally affected by the island growth mode of h-GaN on Si(111) and the imperfection in the groove geometry impacts the initial stage of heterophase epitaxy. Primarily, The h–c transition is observed as a non-local phenomenon; it occurs homogeneously and simultaneously along the bottom of the entire secondary groove and forms a one-dimensional (1D) seed layer except for some interruptions where the h–h junction is defected by gaps or incomplete voids. Between these interruptions, epitaxy retains a single crystal but results in a series of c-GaN nanodots on the seed layer with large fluctuation in size and spacing. The adatom incorporation observed in this heterophase epitaxy is a 1D analog to the wetting of a substrate followed by the self-assembly in conventional quantum dot epitaxy. The surface morphology of the c-GaN nanodots is governed by the faceting mostly composed of (001)- and (11n)-orientations and the roughening between these facets that ultimately affect the morphology of the final top surface of the c-III-N. The interruptions interfere with the homogeneity of the h–c transition and can cause antiphase defects and mosaicity. Based on experimental results, a solution to improve these issues is proposed.

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