Abstract
In deposited on UHV cleaved p-WSe 2 (0001) is investigated by photoelectron spectroscopy (XPS, UPS), low energy electron diffraction (LEED), scanning electron microscopy (SEM), and surface photovoltage (SPV) experiments. In forms an atomically abrupt, non-reactive metallic overlayer on the substrate. It grows in threedimensional clusters (Volmer-Weber growth mode). The experimentally observed band bending induced by In at RT is smaller than expected by the Schottky limit. Photoemission source induced SPV values at 100 K are saturated and different for the substrate and In overlayer emission lines. The results are explained by laterally inhomogeneous electric potential distributions due to the In clustering on the semiconductor surface.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
