Abstract
The authors report on the comparative study of formation of vanadium pentoxide (V2O5) nanorods deposited on amorphous glass substrate using thermal evaporation (TEVP) and pulse laser deposition (PLO) techniques. The x-ray diffraction pattern shows the formation of highly (001)-oriented, orthorhombic V2O5 thin films with high degree of crystallinity via both the fabrication techniques. Atomic force microscopy and field emission scanning electron microscopy revealed the formation of V2O5 nanorods at deposition temperature of 400°C. Further, the detailed growth mechanism ofV2O5nanorods formation is explained.
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