InGaAs ridge-waveguide distributed Bragg reflector laser with first-order grating fabricated by nanoimprint lithography

Abstract

A distributed Bragg reflector (DBR) laser with a surface relief grating was fabricated by a simple process using room-temperature nanoimprint lithography. An imprint mold for first-order DBR gratings with a period of 151 nm was formed using a silica plate. The grating pattern was imprinted on a nanoimprint layer and then transferred into an InGaAs quantum well waveguide by reactive ion etching. A single-mode lasing at a wavelength of 984.3 nm with a side-mode suppression ratio of 30 dB and a maximum output power of 42 mW were obtained under CW operation.