Abstract
Infrared photolysis of methyl-, ethyl- and n-propyltrifluorosilanes was studied in the gas phase in order to clarify inductive effect of trifluorosilyl group. It was observed that homolysis of methyltrifluorosilane occurs by cleavage of the Si–C bond, but ethyl- and propyltrifluorosilanes are ruptured into the C 1–C 2 bond. On the basic of the experimental and quantum chemical data we concluded that the silicon–carbon bond is much strengthened due to strong polar effect in both the silicon–fluorine and the silicon–carbon linkages.
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