Abstract
Chalcogen-doped microstructural silicon irradiated by femtosecond laser has high near-uniform absorption on a broad spectrum, but the factors leading to infrared absorption are complex and remain an open problem. To clarify the origin of infrared absorption besides hyperdoped Chalcogen atoms, microstructural silicon is fabricated by femtosecond laser under vacuum condition. The relationship between infrared absorption and as-formed new phases (amorphous silicon: $\alpha $ -Si and nanocrystal silicon) is established. It indicates that the infrared absorption is caused by defects related to Urbach states from $\alpha $ -Si or nanocrystal Si, and these metastable defects disappeared after a thermal annealing process. From the absorption spectrum of microstructural silicon after etching at different times, it could be figured out that the Urbach states exist in both the surface and subsurface regions of black silicon at a depth of about 2.4 $\mu \text{m}$ .
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
