Abstract
TiO 2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO 2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotometer, respectively. The results indicated that working pressure was the key deposition parameter influencing the TiO 2 film phase composition at room temperature, which directly affected its photocatalytic activity. With increasing working pressure, the target self-bias decreases monotonously. Therefore, low temperature TiO 2 phase (anatase) could be deposited with high working pressure. The anatase TiO 2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution, which the degradation rate reached the maximum (35%) after irradiation by ultraviolet light for 1 h.
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