Influences of solution plasma conditions on degradation rate and properties of chitosan

Abstract

Abstract In this work, the effects of solution plasma conditions on the degradation rate and properties of chitosan are investigated. Various types of electrodes including tungsten (W), copper (Cu), and iron (Fe) were used. The treatment time and the applied pulse frequency of the bipolar supply varied from 0 to 210 min and 15 to 30 kHz, respectively. The plasma-treated chitosan was characterized by GPC, XRD, FT-IR, and fractionation analysis. The results showed that after plasma treatment for 210 min, the molecular weight of chitosan decreased remarkably, when compared to those of untreated samples. The plasma treatment of chitosan using Fe electrode and high pulse frequency strongly promoted the degradation rate of chitosan. The XRD analysis showed that the crystallinity of plasma-treated chitosan was destroyed. FT-IR analysis revealed that the chemical structure of chitosan was not changed by solution plasma treatment. Solution plasma treatment of chitosan using an Fe electrode provided the highest %yield of water-soluble chitosan. Industrial Relevance In this study, the solution plasma process is introduced to treat chitosan in order to prepare low-molecular-weight chitosan. According to our finding, the solution plasma could be a potential method for the preparation of low-molecular-weight chitosan and chitooligosaccharides. Since the solution plasma is generated under mild conditions (i.e., the reaction proceeds at room temperature and ambient pressure), therefore, it is very attractive for the degradation of polysaccharide polymer and applicable to industrial materials process such as medicine, food, chemical industry, and cosmetics. In addition, we expected that plasma technology could be used instead of conventional enzymatic treatment and chemical treatment which was high cost and contamination process.