Abstract
Abstract F-doped tin oxide (Sn:F) film was prepared by atmosphere pressure chemical vapor deposition (APCVD) on float glass using monobutyltin trichloride (C 4 H 9 SnCl 3 , MBTC) and trifluoro acetic acid (CF 3 COOH, TFA) as the precursor and dopant, respectively. H 2 O with different concentrations was used as the activator. The prepared films were characterized by means of XRD, SEM, and UV-VIS-NIR spectroscopy. Experimental results reveal that the structures and properties of the films are greatly affected by the H 2 O content. H 2 O in a certain range of concentrations will promote the formation of Sn:F film and improve the properties of the films.
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