Abstract
Two kinds of structural film stacks, Ta<sub>2</sub>O<sub>5</sub>\Ag and Ta<sub>2</sub>O<sub>5</sub>\Ag\Ta<sub>2</sub>O<sub>5</sub>, were made for investigating the influence on the optical and electrical properties of ultra-thin Ag film by e adjoining Ta<sub>2</sub>O<sub>5</sub> layers. Different samples were prepared by changing the deposition condition of Ta<sub>2</sub>O<sub>5</sub> with different Argon pressure and sputter power. All samples have a uniform 6nm thickness of Ag layer controlled by deposition time. Optical and electrical measurements were carried out on samples and from the transmission and reflectance spectrum the optical constants can be derived. For Ta<sub>2</sub>O<sub>5</sub>\Ag film stacks, from measurement we found that the optical and electrical properties of 6nm Ag film strongly depend on the deposition condition of Ta<sub>2</sub>O<sub>5</sub> layers. The sheet resistance is changed from 12Ω to 31Ω and reflectance is changed from 21% to 46% at 2500nm wavelength, which indicate the difference in Ag layer structure. But for the Ta<sub>2</sub>O<sub>5</sub>\Ag\Ta<sub>2</sub>O<sub>5</sub> stacks, the changed deposition condition of the upper Ta<sub>2</sub>O<sub>5</sub> layers just bring slightly shift of the optical and electrical property.
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