Abstract
The deposition processes of nanosized particles of silver, palladium and gold on the silicon surface by galvanic replacement in fluoride-containing solutions of AgNO3 in DMF, Pd(NO3)2, and H[AuCl4] in DMSO in an ultrasonic field are studied. The influence of the ultrasonic field on the geometry of metal particles and the morphology of precipitate on the substrate is described. It is shown that ultrasonication of (1–10) mM AgNO3 solutions in DMF promotes the formation of nanostructured films on the silicon surface. The tendency to the nanofilms formation is also observed for gold. It was found that ultrasonication allows the deposition of gold on silicon by galvanic replacement in fluoride-free solutions of H[AuCl4]. An increase of the temperature of the solution causes the formation of dispersed precipitates on the silicon surface and an increase of the particles size.
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