Influence of thin MOCVD-grown GaN layer on underlying AlN template

Abstract

Abstract We have studied the direct growth of a GaN film on an AlN template/sapphire substrate by metalorganic chemical vapor deposition. It was found that the GaN layer causes marked deformation of the underlying AlN template at the initial growth. The intensity of x-ray diffraction from AlN drops by a factor of 5 and the full widths at half maximum of the rocking curves of the on- and off-axis planes are increased from 50 to 300 arcsec. With increasing GaN growth time, these values gradually recover, and the crystalline quality of the GaN film is improved. No alloy formation is observed at the interface between AlN and GaN. An AlN template on a sapphire substrate seems to act as a buffer layer, adjusting the lattice constant to improve the crystallinity of the direct grown GaN. Compared with a GaN film grown on a sapphire substrate, GaN grown directly on an AlN template forms a smoother surface with better crystalline quality in a shorter growth time, and at a lower temperature with fewer nonradiative defects in the band gap.