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Abstract
Thin NiCr films of thickness about 30 nm were deposited by magnetron sputtering onto various types of substrate such as (1) polished vitreous carbon, (2) polished vitreous carbon coated with an evaporated carbon film 20 nm thick, (3) (111)-oriented silicon wafers, (4) thermally grown SiO 2 films on silicon and (5) borosilicate glass. Our investigations which involved the combined use of Rutherford ford backscattering and Auger electron spectroscopy showed that, after annealing of the films in air, surface oxidation connected with the known surface segregation of chromium takes place in all cases, whereas a strong oxygen enrichment at the interface was observed only for polished vitreous carbon substrates. It is suggested that this effect is due to a porous and oxidizable interface which is generated during film growth on vitreous carbon substrates.
Published Version
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