Abstract
Calculations of the field distribution in colloidal SiO2 microspheres are presented. Two cases are considered: small particles on a Si substrate irradiated by the 266 nm light, and larger ones, covered with a gold film and irradiated at 800 nm. Substrate, neighboring spheres and sputtered metal overlayer all significantly modify the field pattern and magnitude. Reflected light is focused inside the spheres, which may lead to their damage. The results can be useful in the analysis of microspheres-assisted nano-patterning.
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