Influence of the physicochemical nature of chemical stimulators and the way they are introduced into a system on the mechanism of the thermal oxidation of GaAs and InP

Abstract

Studies of the chemically stimulated thermal oxidation of GaAs and InP demonstrate that the physicochemical nature of the chemical stimulator determines the mechanism of the process and the possibility of introducing it into the system in different ways. It has been shown that, when a chemical stimulator is introduced through the gas phase or applied to a semiconductor surface by mild methods, the oxidation process follows an oxygen transfer mechanism. When harsh methods are used to apply chemical stimulators that ensure persistent cyclic behavior of the process, it follows a synchronous catalytic mechanism.