Abstract
The influence of the electrolyte composition and pH on the anodic currents obtained during electrochemical etching of p-type silicon in aqueous HF solutions has been investigated. Original and accurate pH measurements were performed to characterize the exact composition of the HF + H 2O electrolytes commonly used. It is shown that for these very acid solutions (pH < 2) almost all fluoride is in the form of the non-dissociated HF species which appears to play a preponderant role in the silicon dissolution reaction kinetics. The effect of pH can be restricted to its influence on the modification of the different concentrations by shifting the equilibria.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
