Abstract
A silicon/metal nanocomposite is fabricated electrochemically by anodization of a silicon wafer leading to a porous structure and subsequent metal deposition into the pores. The pores are oriented and separated from each other, offering a morphology in the mesoporous regime. The precipitation of the metal within the pores is performed by pulsed electrodeposition whereas the pulses are used as a tool to influence the structural characteristics of the embedded metal structures. By varying the frequency of the pulsed current the geometry of the metal structures can be modified between spherical particles and needle-like structures of a few microns in length. Magnetic characteristics of the nanocomposite samples depend on the shape of the incorporated structures but also on their magnetic interactions.
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