Abstract
SummaryThe effect of temperature and type of solvent on the microdomain orientation during solvent‐annealing of block copolymer ultrathin films on silicon substrates was investigated using asymmetric polystyrene‐block‐poly(2‐vinylpyridine) (PS‐b‐P2VP) diblock copolymer. When the solvent‐annealing was performed with THF at 20°C, the ultrathin film exhibited a mixed orientation of cylinders parallel and perpendicular to the substrate while at 25°C only parallel cylinders were observed by AFM. The solvent annealing with acetone gave a dot pattern at 20°C and a line pattern at 25°C. On the other hand, in the case of solvent‐annealing with toluene perpendicular cylinders were observed at 25°C while at 20°C the morphology was not clear. The orientation and morphology of microdomains as well as the kinetics in PS‐b‐P2VP ultrathin films on solvent‐annealing is significantly affected by temperature and type of solvent. By controlling temperature and selecting the solvent, perpendicular cylinders can be formed predominantly on the substrates.
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