Abstract
We study the variation of sputtering yields with surface morphologies under the assumption of a specially prescribed surface shape. Compared with a flat surface, we show that surface morphology can cause a decrease in the sputtering yield and an increase in the incident angle where sputtering yield is maximum. Based on Sigmund's theory, an analytical formula for the morphology dependent sputtering yield is developed by averaging the curvature dependent sputtering yield. The predicted dependence of sputtering yield on surface morphology is in good agreement with experimental observations.
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