Influence of Substrate Temperature and Bias Voltage on Structure and Mechanical Properties of CrN Coatings

Abstract

CrN coatings have been deposited successfully by Closed Filed Unbalanced Magnetron Sputter Ion Plating (CFUMSIP). The effect of substrate temperature (TS) and bias voltage (VB) together on microstructure, morphologies and mechanical properties of CrN coatings were studied. The results showed that the deposition rate of CrN coatings declines with the increase of VB Under both room temperature (R.M.) and 300°C. The FCC-CrN disappeared gradually and orth-CrN arised with the increase of VB, and the TS promoted the transformation from FCC - CrN to orth - CrN. The surface morphology of CrN coatings with changed VBs was greatly different, and VB could further improve the mechanical properties of coatings. In this paper, the CrN coating with the parameters (TS =300°C, VB =-30V) had relatively high deposition rate and mechanical properties.