Abstract
Titanium nitride (TiN) thin films have been prepared by direct-current reaction magnetron sputtering technique on different substrates (glass and Si) and the influence of substrate and Ar/N2 gas flow ratio on structural, optical and electrical properties of TiN thin films were discussed. X-ray diffraction suggested that with the ratio of Ar/N2 decreasing, the diffraction intensity of (111) plane gradually diminished while (200) plane increased and films on Si substrate exhibited better crystalline quality than glass substrate. Improvement of Ar/N2 ratio is contribute to enhance the deposition rate and the obvious surface roughness were observed when the ratio up to 49. Photoluminescence spectra showed that TiN films on Si substrate showed higher intrinsic emission and lower defect emission. Moreover, the resistivity of TiN films showed obviously decreasing as the flow rate ratio of Ar/N2 increased, especially films on Si substrate.
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