Abstract
The structure, phase composition, and morphology of FeSi and FeSi2 nanofilms grown by three alternations of Fe (with a wedge-shaped thickness in the range 0 ‒ 2 ml) and Si (with a thickness 1 ML) depositions on a Si (001) 2×1 substrate heated to 400 °C were studied. According to Auger electron spectroscopy and electron energy loss, FeSi and FeSi2 films were formed before and after the third deposition of Si, respectively. With this, a FeSi2 film had ~1.5 ML of Si, which segregated on its surface. Both films consisted of a wetting coating (WL) and bulk phase forming at 2‒3 ML and after 3 ML of Fe, respectively. According to data of low electron energy diffraction, these films had a nanocrystalline structure. Moreover, according atomic force microscopy, deep square pores were formed in FeSi2 films. They had a depth of 18‒10 nm, which was decreased and then increased before and, respectively, after Fe thickness ~ 3 ML.
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