Abstract

Tungsten oxide films with different preferred orientations were deposited by reactive magnetron sputtering with glancing angle deposition. The influence of the structural orientation of the films on the NO 2 gas sensing properties was investigated through orthogonal experiments. The film deposited at a lower Ar/O 2 ratio and higher sputtering pressure displayed a significantly enhanced NO 2 sensing performance, which can be attributed to the high crystallinity and (200)-preferred orientation of monoclinic WO 3 . There are more active sites near the surface of the (200)-oriented WO 3 films, which is beneficial for NO 2 adsorption, enhancing the gas sensing properties. Clarifying the effect of structural orientation on the gas response will guide further optimization of sensing films, aiding the fabrication of high-performance MEMS gas sensors. • WO 3 films with different degrees of preferred orientation were deposited by glancing angle deposition. • The WO 3 film with higher crystallinity and stronger (200)-preferred orientation displayed significantly enhanced response to NO 2 . • The improvement of sensing performance can be mainly attributed to more active sites for NO 2 adsorption near the surface of (200)-oriented monoclinic WO 3 . • The effect of structural orientation on gas response of WO 3 films can be used as a reference for further optimization of sensing films.

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