Abstract
The ion bombardment of strained cylindrical <110> -oriented Co nanowires is simulated by molecular dynamics. The number of ejected particles (sputtering) associated with this phenomenon is analyzed. Sputtering is a process frequently used as a technique of modification and analysis. The sputtering of nanorods has attracted considerable attention just recently because an enhanced yield is obtained in these systems. However, the influence on this process of other effects such as the stress or the associated deformation is not sufficiently known. For uniaxial stress, yield increases both for compression and for stretch in the elastic range, although changes are small. However, before reaching the elastic limit (high stress), yield decreases for stretch. In the plastic range, necking areas for stretch and buckling areas for compression arise. When these areas are bombarded, a noticeable decrease in sputter yield can be observed. Changes in the lattice orientation would explain this behavior. Finally, an analysis of the influence of diverse factors: lattice orientation, stacking faults and deformation on sputtering is accomplished.
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