Abstract
Magnetic properties of ion beam sputter-deposited TbFeCo and GdFeCo thin films with their compensation point were studied using ferromagnetic Hall effect measurement. Gdx(Fe90Co10)1−x thin films sputter deposited using Kr exhibited high squareness ratio and sharp magnetization reversal compared with those prepared using Ar as sputtering gas. Lower kinetic energy of sputtering ions was effective to attain higher squareness ratio. Ferromagnetic Hall effect clarifies the magnetization reversal process of a FeCo(xnm) layer contacted to a TbFeCo(50nm) layer. FeCo layer with thickness less than 2nm is magnetized together with TbFeCo layer. Ferromagnetic Hall measurement is a powerful tool to determine the magnetization process of very thin films and magnetically coupled layers.
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