Abstract

In this study, the influence of the deposit thickness of SiO2 insulation layers on the magnetic behaviors of Fe-Si@SiO2 soft magnetic composites (SMCs) was investigated by adjusting the deposition temperatures (550 °C, 600 °C, 650 °C, 700 °C, and 750 °C) during the fluidized chemical vapor deposition (CVD) process. The microstructures of Fe-Si@SiO2 composite particles and SMCs were also studied systematically. After combining the magnetic behavior results, the regression relationships between the magnetic behaviors of Fe-Si@SiO2 SMCs and the SiO2 insulation layer thickness distribution were obtained. It was found that the thickness, deposition rate, and heterogeneity of the SiO2 insulation layer were severely affected by the deposition temperature, resulting in a remarkable variation of the magnetic properties of Fe-Si@SiO2 SMCs. An increasing SiO2 insulation layer thickness had positive effects on the electrical resistivity and the eddy-current loss, almost no effects on the magnetic moment, and negative effects on the saturation magnetization of Fe-Si@SiO2 SMCs. Hence, these results will provide a new insight to examine the growth mechanism of the SiO2 insulation layer and magnetic performance of SMCs, which will be advantageous for the future design of efficient Fe-Si magnets.

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