Abstract
If clean metal surfaces are bombarded with energetic ions in the keV range the predominant contribution to the sputtered flux are neutral metal atoms in the electronic ground state. It is well established that a drastic change in the composition of the sputtered flux is observed when the metal surface is covered with oxygen. In this work we report investigations of the influence of SF 6 coverage on the sputtering of a Cr target. The Cr targets have been cooled to approximately 120 K. At room temperature the sticking probability of SF 6 is negligible. Below 170 K SF 6 is physisorbed at the Cr target surface. With increasing coverage by SF 6 the amount of neutral Cr atoms in the ground state is strongly reduced. At the same time the amount of sputtered excited atoms increases with increasing coverage with SF 6 .
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