Influence of RF power and CH4 flow rate on properties of diamond-like carbon films deposited by PECVD technique

Abstract

In this work, Diamond like carbon (DLC) films were deposited on titanium substrate by plasma enhanced chemical vapor deposition (PECVD) technique. The influences of RF power and CH4 gas flow rate on the properties of the DLC films were studied using X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and synchrotron-based near-edge X-ray absorption find structure (NEXAFS) spectroscopy. The results show that the sp3/sp2 ratio decreases, while the ID/IG increases when RF power increases. The sp3/sp2 ratio increases with CH4 flow rate.