Abstract
In the present work, the electrochemical deposition of tin coatings using pulse plating techniques was investigated. Based on fundamental electrochemical experiments, pure tin coatings were deposited by using direct and pulsed current. Both types of deposits were compared with each other and the effects of the pulse plating parameters, i.e. duty cycle, frequency and current density were investigated. Matt layers with wide powdery areas are obtained with direct current. At low current density and low duty cycle (10%), the pulsed current improves this aspect of the deposit by reducing the formation of powdery deposits. At higher duty cycles, the increase in the frequency additionally improves the hardness of the coating.
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