Abstract
Hafnium carbide is one of the materials with the most potential that can be used for high temperature oxidation resistant coatings. So far, HfC coatings are mainly being produced by chemical vapour deposition technique. In this work, HfC coatings were produced using a reactive magnetron sputtering method. The reactive gas used in these experiments was mixture of CH4 and H2. The study is focused mainly on the effect of process parameters, applied radio frequency (RF) power, process pressure and reactive gas flow, on the deposition rate and crystal structure of the deposited HfC coatings.
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