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Abstract
The possible use of the absorption band at 1207 cm−1 for the measurement of the concentration of interstitial oxygen (Oi) in silicon samples subjected to a precipitation thermal treatment is discussed. The results of low temperature infrared absorption measurements show that the conversion factor for such evaluation of the residual Oi after precipitation is strongly influenced by the presence of oxide precipitates; a limit value for the concentration of precipitated oxygen is identified, above which the measure becomes unreliable.
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