Abstract
The problem of adsorption desorption of methyl radicals on a surface with nanoscale curvature is numerically studied for typical chemical vapor deposition diamond growth conditions. Surface profiles with concave nanoscale curvature lead to an increase in the energy of adsorption, which can enhance the nucleation of the new phase on the substrates. Moreover, the nanoscale curvature is even able to provoke a nucleation of the new phase on substrates which do not have an affinity for nucleation.
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