Abstract
Plasma materials processing for microelectronics fabrication, formerly an empirical technology, has in recent years greatly benefited from the use of modeling and simulation (MS) for equipment and process design. The maturation of plasma equipment and feature scale MS has resulted from a better understanding of the underlying physics and chemistry, from innovation in numerical algorithms and in the development of a more comprehensive fundamental database. A summary is presented of the historical development, present status and future potential of MS for feature evolution and plasma reactor design.
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