Abstract
Diborane (B2H6) glow discharges were carried out for the study of influence of material type and surface roughness of substrate on the boronization and its plasma performance. We found that for the stainless steel (SS), the surface roughness should be smaller than 0.8 μm with an optimal value of 0.4 μm, in order to reach a maximum binding force of 320 N/m. The effective boron (B) film growth by using the same parameter was also realized on both the surface of SS and Si substrate, but not on the Cu substrate, mainly due to the easy enrichment of O element on Cu surface through formation of the B–O bond, which prevents subsequent formation of the B–B bond. After boronization, the partial pressure of residual gases of H2O, CO2, CO and O2 was reduced by 47%, 80%, 56% and 33%, respectively, indicating the successful reduction of O and C impurities in the chamber.
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