Abstract
In order to improve the discharge characteristics of Magnesium Oxide (MgO) thin films, hydrogen was doped to MgO thin films using an ion plating technique. Changes in the surface morphology, crystal orientation, optical properties, secondary electron emission coefficient, and defect states were studied with increasing hydrogen flow rates during the growth using field emission scanning electron microscope, X-ray diffraction, ellipsometry, γ-focused ion beam, and photoluminescence analysis. The change in firing voltage and delay time in plasma display panels (PDP) with the hydrogen-doped MgO thin films were also investigated. The results indicated that optimal hydrogen doping conditions can affect the surface structure and defect states: resulting in a significant reduction in the firing voltage and delay time of the PDP.
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