Influence of HPPMS pulse length and inert gas mixture on the properties of (Cr,Al)N coatings

Abstract

During the production of plastic products by injection molding processes adhesion and abrasion wear as well as corrosion take place in the molding tools. Concerning this, (Cr,Al)N coatings deposited via physical vapor deposition (PVD) have a good potential to be used as protective coatings on injection tools. For an effective protection of coated tools a uniform layer of coating material is also required. In this regard, the HPPMS (high power pulse magnetron sputtering) technology offers possibilities to improve coating thickness uniformity as well as to adapt the chemical and mechanical properties. The present work deals with the investigation of influence of HPPMS pulse length and the argon/krypton ratio in the deposition process on (Cr,Al)N coating properties. For this reason, (Cr,Al)N coatings were deposited with HPPMS pulse length of 40, 80 and 200μs at constant Ar/Kr ratio (120/80sccm). The results were compared with a coating deposited with DC Magnetron Sputtering (DC-MS) with the same Ar/Kr ratio. Afterwards, a (Cr,Al)N coating was deposited with constant pulse length (200μs) without Kr. The chemical composition, morphology and phase composition of the coatings were analyzed by means of EDS (Energy Dispersive Spectroscopy), SEM (Scanning Electron Microscopy) and XRD (X-ray Diffraction), respectively. The composition of the surface near region in the samples was investigated by means of XPS (X-ray Photoelectron Spectroscopy). Mechanical properties were measured by means of nanoindentation. Decreasing of pulse length at constant mean power leads to a considerable increase of cathode current. It could be observed that the deposition rate of the HPPMS process reduces with decreasing pulse length. Nevertheless, short HPPMS pulse lengths and high peak currents lead to an increase of hardness from 25GPa to 32GPa while the DC-MS coating displays a hardness of 18GPa. The use of krypton within the sputter process leads to a marginal increase of the deposition rate while the mechanical properties are not significantly changed. In addition, EIS (electrochemical impedance spectroscopy) was employed to investigate the defect structure of the coatings.