Abstract
Humic substances constitute an important part of persistent organic matter in natural waters. This study focuses on standard humic acid (HA) degradation by UV irradiation alone and combined with H2O2. At high concentration, chloride is known to be a radical scavenger that could affect humic acid degradation by photochemical processes. The influences of pH, NaCl presence and H2O2 concentration are discussed here. UV irradiation shows a slight HA degradation but addition of H2O2 greatly improved aromatics removal. Higher the pH and higher the H2O2 dose, more HA is degraded. In chloride ion presence, HA degradation is reduced that confirms chloride scavenging effect. Also, high ionic strength impacts on HA molecular configuration limiting its degradation.
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