Abstract
The hydrogenated AZO (HAZO)/Ag/HAZO nano-multilayer structure thin films have been prepared on soda-lime glass substrates by DC magnetron sputtering at low temperature. The influence of H2 flow ratio on structural, morphologic, optical and electrical properties of HAZO/Ag/HAZO films was investigated. It is found that the introducing hydrogen in sputtering atmosphere plays a significant role on the photoelectric properties of the tri-layer thin films. High quality transparent conductive films with minimum sheet resistance of 1.86Ω/sq and maximum transmittance of 93% at 500nm wavelength were obtained. The maximum figure of merit of the film reached 2.09×10−1Ω−1 at the H2 flow ratio of 0.02. These tri-layer thin films have promising potential served as transparent conductive electrodes for optoelectronic devices.
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