Abstract

The influence of oxygen induced gap states on the device operation and the stability of polycrystalline pentacene thin film transistors (TFTs) was investigated by electrical in situ measurements. Unexposed devices are stable, whereas devices exposed to dry oxygen exhibit a shift of the threshold voltage upon prolonged device operation. Stressing the transistor in the on-state (negative bias) leads to a shift of the threshold voltage towards negative gate voltages, whereas prolonged bias stress in the off-state causes a shift of the threshold voltage in the opposite direction. The gap states are formed 0.18eV (acceptor-like states) and 0.62eV (donor-like states) above the valence band maxima. The charge carrier mobility and the on/off ratio of the transistor are not affected by the gap states. A simple density-of-states model will be presented, which allows for the explanation of the experimental results.

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