Abstract
Nanocrystalline V2O5 thin films have been grown at low temperature on glass substrates by dc magnetron sputtering using a vanadium metal target. Film thickness was found to have a great impact on the orientation, shape, and size of the crystallites of these films. X-ray diffraction (XRD) patterns of the films with a thickness of 110nm show a strong c-axis orientated crystal structure with a preferred (001) orientation, while those with a thickness of 315nm show mixed orientations (a-axis+c-axis). With further increase in film thickness, an a-axis orientation with predominant (200) reflection was observed in the XRD pattern. The shape of the crystallite changes from a rodlike to a bricklike structure with change in crystallographic orientation from (001) to (200). Atomic force microscopy results were also in agreement with the field emission scanning electron microscopy and XRD results. A direct correlation has been established between the semiconductor to metal transformation of V2O5 films and their crystallite size and orientation. The optical measurement also revealed a systematic band gap variation (from 2.50to2.20eV) with variation in film thickness.
Published Version
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