Abstract
AbstractEthephon [2‐(chloroethyl) phosphonic acid] has improved lodging resistance of several crops, mainly by reducing plant height. Our objective was to determine if ethephon could reduce plant height of soybean [Glycine max (L.) Merr.] without reducing lowest pod height (LPH), which would increase the potential for stubble harvest losses. Maturity group IV soybean cultivars Ripley (short) and Southern States 443 (tall) were planted in both full season and late‐planted cropping systems in 1987 and 1988 on a Maury silt loam (fine, mixed, mesic Typic Paleudalfs) near Lexington, KY. Ethephon was applied at 280 g a.i. ha−1 at growth stages V4, V6, or V4 and V6. All three ethephon treatments reduced plant height to a similar degree. No ethephon effect on lodging was detected, since lodging pressure was minimal. Ethephon did not reduce LPH, and thus had no effect on stubble harvest losses. In addition, ethephon did not influence grain yield. Ethephon successfully reduced plant height without increasing stubble harvest losses. No conclusion on the effect of ethephon on lodging resistance of soybean can be drawn from this research.
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