Abstract
Plasma focus (PF) generation has advanced the development of high-density, high-temperature plasma that emits intense radiation. The radiation output and emission spectra depend on the operating parameters of the PF device. The ability to focus plasma governs the pinch radius and electrical properties at the truncated end of the PF device. In this study, the simulation system RADPF 5.15 FIB was used to investigate the pinching properties of the neon ion beam generated using an AECS PF-1 device. The pinch radius was the dominant factor affecting the current density produced.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
