Abstract
A radio frequency glow discharge mass spectrometry (rf-GDMS) source was evaluated toward future applications in the depth-resolved analysis of both metallic and nonconducting samples. The effects of the discharge conditions of rf power, gas pressure, and limiting orifice (anode) diameter were investigated to determine their influence on sputtering characteristics, resultant crater shapes, and analyte ion intensities. Other significant variables including nonconductive sample thickness and sputtering time were also examined. These studies rendered information about the respective parameters' roles in the sputtering process as well as possible ionization mechanisms. The ability of the rf-GD mass spectrometric technique to perform depth-resolved analysis was demonstrated through depth profiling of a simulated mirror, a superlattice material, and a painted automotive panel.
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