Abstract
Setting the thickness and pressure for an absorbing plasma is difficult in plasma stealth engineering. In this study we established a numerical model of electromagnetic wave propagation in radiofrequency plasma using a z-transformed, finite-difference, time-domain method. We studied the effects of thickness and pressure on the reflectance, transmittance and attenuation of the plasma under three typical electron density distributions: uniform, axially symmetric and monotonic. The results show that the electron density distribution has a significant influence on the electromagnetic wave transmission characteristics. The attenuation effect reaches a maximum when the electron density is increased monotonically along the wave propagation direction. An increase in thickness can significantly increase the attenuation rate of the incident wave and reduce the transmittance, but has little effect on the reflectance. An increase in air pressure reduces the reflectance of the incident wave and increases the transmittance and the attenuation rate. However, once the air pressure exceeds a certain threshold, any further increase in air pressure will no longer enhance the attenuation rate.
Highlights
Plasma stealth technology has the advantage of real-time regulation of the absorbing band and does not affect the aerodynamic performance of an aircraft or the bandwidth of the absorbing wave
We investigated the effect of plasma thickness and gas pressure on the reflectance, transmittance and attenuation rate for three ne distributions
The results show that the ne distribution has a significant influence on the characteristics of electromagnetic wave transmission
Summary
Plasma stealth technology has the advantage of real-time regulation of the absorbing band and does not affect the aerodynamic performance of an aircraft or the bandwidth of the absorbing wave. A low-voltage radiofrequency (Rf) plasma is a stable plasma induced by an Rf discharge in a low-voltage cavity and has a working pressure ranging from mTorr to Torr, high electron density (1017–1018 m-3), a large discharge area and a simple discharge device structure. Another advantage of plasma stealth technology is that its plasma frequency can respond to the radar wave band (
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