Influence of deposition time on the chemical bonding and composition of amorphous carbon nitride films

Abstract

Amorphous carbon nitride (a-CNx) films have been deposited using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) under various deposition times. The effects on chemical bonding and composition of this film were characterized by using Fourier Transform Infrared Spectroscopy (FTIR) and Energy Dispersive X-Rays Spectroscopy (EDX) respectively. The spectrum shows several band that exist in this film such as C<private-char description='Single_Bond' name='Single_Bond' value='Single_Bond'/>N (1020–1280 cm-1), C<private-char description='Double_Bond' name='Double_Bond' value='Double_Bond'/>C (1300–1500 cm-1), C<private-char description='Double_Bond' name='Double_Bond' value='Double_Bond'/>N (1500–1800 cm-1), C<private-char description='Triple_Bond' name='Triple_Bond' value='Triple_Bond'/>N (2000 – 2300 cm-1), C<private-char description='Single_Bond' name='Single_Bond' value='Single_Bond'/>H (2800–3000 cm-1), and N<private-char description='Single_Bond' name='Single_Bond' value='Single_Bond'/>H/O<private-char description='Single_Bond' name='Single_Bond' value='Single_Bond'/>H (3300–3500 cm-1). The longer deposition time allows the increase in occurrences of breaking the C<private-char description='Single_Bond' name='Single_Bond' value='Single_Bond'/>N bonds which results in the decrease in nitrogen content.