Abstract
The effect of substrate temperature ( T s) and bias voltage ( U s) on the structure of cathodic arc ion-plated coatings from metals (Ni, Cr), alloys (Ni-Cr, NiCrA1Y) and ceramics (Zr-N, Zr-O, Cr-C) is discussed. The coatings were deposited by arc vacuum evaporation of the metals and alloys at U s=0–300 V, T s≤1000°C. The ceramic coatings were produced by the reactive arc evaporation method. The coatings thickness was in the range 40–100 μm. The coatings were investigated by X-ray diffraction analysis, energy dispersive X-ray microanalysis, and scanning electron and light microscopy. It was shown that the variation of U s and T s had an effect on: (1) the phase composition; (2) the grain size in the coatings; (3) a coating texture; (4) lattice distortions; and (5) the chemical composition (for the binary and multicomponent coatings). The effect of U s on deposition rate of the NiCrA1Y multicomponent coating was also studied. The reasons of these phenomena are discussed.
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