Influence of deposition pressure on the microstructure and mechanical properties of sputter-deposited MoNbTaW refractory multi-principal element alloy thin films

Abstract

A systematic investigation into the effects of deposition pressure on the microstructure and mechanical properties of MoNbTaW refractory multi-principal element alloy (RMPEA) films deposited on Silicon (100) substrates using direct current magnetron sputtering (DCMS) is presented. The deposition pressure was varied from 3 Pa to 0.3 Pa at a homologous temperature (T/Tm) ≤ 0.1. The crystal structure, surface morphology, cross-sectional microstructure and mechanical properties were studied using X-ray diffraction, scanning and transmission electron microscopy and nanoindentation. X-ray diffraction findings indicate a single-phase BCC structure throughout the pressure range. An evolution in surface morphology was observed, coupled with a transition from a void-rich to a densified microstructure as the deposition pressure decreased, in line with the structure zone model. Additionally, variations in crystallographic orientations were detected, with changes in I(110)/(211) suggesting an interplay between film growth dynamics and crystallographic orientation shifts with the deposition pressure. The mechanical properties have shown significant improvement, with hardness and modulus values increasing from 7GPa to 12 GPa and 135 GPa to 243 GPa, with a decrease in deposition pressure. The study provides insights into the deposition mechanism, highlighting that microstructural changes and variations in crystallographic orientations are influenced by deposition pressure-induced alterations in adatom energy and surface mobility, thus affecting the films' mechanical properties.