Influence Of Deposition Parameters On The Structural, Optical And Electrical Properties Of Amorphous Carbon And Amorphous Carbon Nitride Films Grown By Pulsed Laser Deposition Using Camphoric Carbon Target

Abstract

The role of laser fluence (LF) and target to substrate distance (TSD) on the surface morphology, deposition rate, composition, structural, optical and electrical properties of amorphous carbon (a-C) and amorphous carbon nitride (a-CN x ) films deposited by Xe-Cl excimer pulsed laser deposition is reported. At fixed TSD, the surface roughness, particle density and deposition rate increase, whereas the particle size decreases with higher LF. When the LF is fixed, TSD decreases resulting in an increase in the irregular small particle size, particle density, surfaces roughness and deposition rate. We found that the amorphous structure of a-C and a-CN x films is strongly dependent on the LF and TSD. The a-CN x films with high deposition rate have relatively high nitrogen content and high electrical resistivity.