Abstract
We investigated the variations in the structure and optical properties of TiO 2 films produced by reactive d.c. plasmatron sputtering with the most important deposition parameters. Over a wide range, the phase composition (ratio of rutile to anatase) and the grain size of the TiO 2 films can be influenced in a controlled manner by variations in the substrate temperature and the oxygen partial pressure. Because of their high refractive index and low light-scattering losses, plasmatron-sputtered TiO 2 films are of great interest in the field of optical interference coatings, e.g. for dielectric multilayer stacks.
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